The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2026

Filed:

Feb. 07, 2023
Applicant:

Infineon Technologies Austria Ag, Villach, AT;

Inventors:

Hans Weber, Villach, AT;

David Kammerlander, Villach, AT;

Andreas Riegler, Wernberg, AT;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/04 (2006.01); H10D 12/01 (2025.01); H10D 30/83 (2025.01); H10D 62/17 (2025.01); H10D 62/832 (2025.01);
U.S. Cl.
CPC ...
H10D 30/831 (2025.01); H01L 21/047 (2013.01); H10D 12/031 (2025.01); H10D 62/328 (2025.01); H10D 62/8325 (2025.01);
Abstract

A trench junction field effect transistor (trench JFET) includes a mesa region confined by first and second trenches along a first lateral direction. The first and second trenches extend into a semiconductor body from a first surface of the semiconductor body. A mesa channel region of a first conductivity type is confined, along the first lateral direction, by first and second gate regions of a second conductivity type. A first pn junction is defined by the mesa channel region and the first gate region. A second pn junction is defined by the mesa channel region and the second gate region. The mesa channel region includes, along the first lateral direction, first, second and third mesa channel sub-regions having a same extent along the first lateral direction.


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