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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12548741 B1

PDFFull Text
Date of Patent:
Feb. 10, 2026

Filed:

Jul. 10, 2023

Focus ring and plasma etching device including same

Applicant:

Solmics Co., Ltd., Pyeongtaek-si, KR;

Inventors:

Kyungyeol Min, Seoul, KR;

Yongsoo Choi, Seoul, KR;

Sungsic Hwang, Seoul, KR;

Kyungin Kim, Seoul, KR;

Jungkun Kang, Seoul, KR;

Su Man Chae, Seoul, KR;

Assignee:

Solmics Co., Ltd., Pyeongtaek-si, KR;

Attorney:

NSIP Law

Primary Examiner:

Benjamin Kendall

Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32642 (2013.01); H01J 37/32715 (2013.01);
Abstract

A focus ring for mounting an etching target in a plasma etching device, includes a seating portion, including a seating surface configured to accommodate the etching target; and a main body, formed on an outer circumference of the seating portion, comprising a groove portion having a groove disposed in an upper surface of the main body. A height of an upper surface of the groove portion is lower than a maximum height of the upper surface of the main body.

Find Patent Forward Citations

Min, Kyungyeol. (2026). Focus ring and plasma etching device including same (U.S. Patent No. 12548741). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12548741

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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