The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2026
Filed:
Jun. 09, 2023
Robert Bosch Gmbh, Stuttgart, DE;
Chaithanya Kumar Mummadi, Pittsburgh, PA (US);
Wan-Yi Lin, Pittsburgh, PA (US);
Filipe Condessa, Pittsburgh, PA (US);
Aniruddha Saha, Elkridge, MD (US);
Shuhua Yu, Pittsburgh, PA (US);
Robert Bosch GmbH, Stuttgart, DE;
Abstract
A computer-implemented system and method relate to certified robust defenses against adversarial patches. A two-mask image is generated using a first mask and a second mask with respect to a source image. The two-mask image is associated with a highest prediction loss. A set of two-submask images are generated using a first submask and a second submask with respect to the source image. The first submask refers to a portion of the first mask. The second submask refers a portion of the second mask. A machine learning system generates a set of predictions upon receiving the set of two-submask images. A particular two-submask image with a highest prediction loss is selected from among the set of two-submask images. The machine learning system is trained via a training dataset, which includes the source image, the two-mask image, and the selected two-submask image.