The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2026
Filed:
Jun. 30, 2021
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Quanfu Fan, Lexington, MA (US);
Sijia Liu, Somerville, MA (US);
Gaoyuan Zhang, Medford, MA (US);
Kaidi Xu, Boston, MA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 18/214 (2023.01); G06F 3/12 (2006.01); G06N 20/00 (2019.01);
U.S. Cl.
CPC ...
G06F 18/2148 (2023.01); G06F 3/1208 (2013.01); G06F 3/1226 (2013.01); G06N 20/00 (2019.01);
Abstract
Adversarial patches can be inserted into sample pictures by an adversarial image generator to realistically depict adversarial images. The adversarial image generator can be utilized to train an adversarial patch generator by inserting generated patches into sample pictures, and submitting the resulting adversarial images to object detection models. This way, the adversarial patch generator can be trained to generate patches capable of defeating object detection models.