The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2026
Filed:
Mar. 01, 2023
Ncs Testing Technology Co.,ltd, Beijing, CN;
Lei Zhao, Beijing, CN;
Haizhou Wang, Beijing, CN;
Lixia Yang, Beijing, CN;
Lei Yu, Beijing, CN;
Xuebin Chen, Beijing, CN;
Hui Wang, Beijing, CN;
Xuejing Shen, Beijing, CN;
Yunhai Jia, Beijing, CN;
Dongling Li, Beijing, CN;
Xing Yu, Beijing, CN;
NCS Testing Technology CO., LTD, Beijing, CN;
Abstract
The present invention discloses an integrated research and development system for high-throughput preparation and statistical mapping characterization of materials, comprising: a high-throughput preparation module, a high-throughput characterization module, an automatic control module and a statistical mapping data processing module; the high-throughput preparation module is used for preparing a multi-component combinatorial-sample; the high-throughput characterization module comprises a plurality of different high-throughput characterization devices; the automatic control module comprises a special sample box, a sample moving platform, an intelligent mechanical arm and a synchronous control system; and the statistical mapping data processing module is used for constructing a statistical mapping constitutive model corresponding to position mapping according to the composition, microstructure and performance data of the combinatorial-sample. The present invention integrates multiple functions, has high automatic control level, improves the experimental speed and experimental efficiency.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile