The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2026

Filed:

Apr. 04, 2023
Applicant:

Meta Platforms Technologies, Llc, Menlo Park, CA (US);

Inventors:

Daniel Guenther Greif, Kirkland, WA (US);

Brian Wheelwright, Sammamish, WA (US);

Zachary Kehs, Seattle, WA (US);

Assignee:

Meta Platforms Technologies, LLC, Menlo Park, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/08 (2006.01); G02B 26/10 (2006.01); G02B 27/00 (2006.01);
U.S. Cl.
CPC ...
G02B 27/0031 (2013.01); G02B 26/10 (2013.01);
Abstract

Static non-uniformity effects in a coherent biresonant scanning projector are mitigated through correction factors for pulse events during one frame time. According to an analytical approach, a set of input parameters such as scan angle, micro-electromechanical system (MEMS) obliquity, ridge spacing, etc. are used to optimize color-wise luminance uniformity. According to an optimization approach, pulse correction factors are determined using a custom-defined cost function that attempts to optimize for both luminance and color uniformity.


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