The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2026

Filed:

Jan. 25, 2022
Applicant:

Nanoentek, Inc., Seoul, KR;

Inventors:

Chan Il Chung, Seoul, KR;

Hyoung Seop Lee, Gyeonggi-do, KR;

Sanghwa Ahn, Gyeonggi-do, KR;

Assignee:

NANOENTEK, INC., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 15/1433 (2024.01); G01N 15/01 (2024.01); G01N 15/14 (2024.01);
U.S. Cl.
CPC ...
G01N 15/1433 (2024.01); G01N 15/1456 (2013.01); G01N 15/01 (2024.01); G01N 2015/1486 (2013.01);
Abstract

In a fine particle counting method using a multi-channel sample chip and a fine particle counting apparatus implementing the method, a plurality of samples is observable in a short period of time and even when warpage occurs during a manufacturing process as a sample chip becomes larger, the warpage is corrected so as to count fine particles accurately. Problems that a focal distance of each channel is not constant due to warpage occurring in a chip having a plurality of channels, and thus it takes a lot of time to obtain an image by obtaining a focus value for each channel may be solved. A problem that since an amount of sample injected into each channel is small, a sample dries out when an image is not quickly obtained and used for counting, thereby causing the occurrence of measurement error may be prevented.


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