The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2026
Filed:
Jul. 27, 2023
Aptiv Technologies Ag, Schaffhausen, CH;
Xin Zhang, Agoura Hills, CA (US);
Stuart Rogers, Oak Park, CA (US);
Zhengzheng Li, Agoura Hills, CA (US);
APTIV TECHNOLOGIES AG, Schaffhausen, CH;
Abstract
Described herein is NLS using a bounded linear initial search space and a fixed grid with pre-calculated variables. An initial first elevation angle corresponding to a direct reflection from an object and an initial second elevation angle corresponding to a multi-path reflection from the object are received along with a grid comprising pre-calculated variables for each of a plurality of grid points. The initial elevation angle pair is then refined by, for a plurality of iterations, determining a closest grid point to a current elevation angle pair and performing a non-linear least squares iteration on the closest grid point using the pre-calculated variables for the closest grid point to determine a next elevation angle pair. When the iterations have converged, a height of the object is calculated based on a final elevation angle pair.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile