The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2026

Filed:

Jun. 30, 2022
Applicant:

Advanced Micro Devices, Inc., Santa Clara, CA (US);

Inventors:

Wei-Chih Hung, Hsinchu, TW;

PO-Min Wang, Hsinchu, TW;

Yu-Huai Chen, Hsinchu, TW;

Assignee:

Advanced Micro Devices, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/22 (2006.01);
U.S. Cl.
CPC ...
G01B 11/22 (2013.01);
Abstract

Techniques for generating a depth map are described. The techniques include obtaining a set of phase difference measurements with a phase detect sensor, and generating a depth map based on the set of phase difference measurements, utilizing a first set of calibration data correlating phase difference measurements with lens defocus data and a second set of calibration data correlating lens positions with object distances.


Find Patent Forward Citations

Hung, Wei-Chih. (2026). Depth map construction by camera phase detection and lens calibration (U.S. Patent No. 12546585). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12546585

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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