The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2026

Filed:

Feb. 06, 2023
Applicant:

B.e. Meyers & Co., Inc., Redmond, WA (US);

Inventors:

Thomas Alldredge, Clinton, WA (US);

Alexander Bigby, Redmond, WA (US);

Miles Elledge, Woodinville, WA (US);

Spencer Nelson, Kirkland, WA (US);

Assignee:

B.E. Meyers & Co., Inc., Redmond, WA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F41G 3/06 (2006.01); F41G 3/08 (2006.01); F41G 3/14 (2006.01);
U.S. Cl.
CPC ...
F41G 3/06 (2013.01); F41G 3/08 (2013.01); F41G 3/145 (2013.01);
Abstract

Aiming a firearm via a disturbed pointer is disclosed and can include receiving a mounting position of a ballistic aiming system with respect to a boresight of the firearm, a detected cant of the firearm, and a determined range to a target. An adjusted aiming solution for the target can be determined based on the mounting position, the detected cant, and the determined range. A projectable pattern of one or more elements can be generated, wherein an element of the elements can be related to a disturbed pointer corresponding to the adjusted aiming solution for the target. A light source can be controlled to output a portion of the projectable pattern of one or more elements comprising the element related to the disturbed pointer, wherein the disturbed pointer can be projected as the adjusted aiming solution for the target.


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