The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2026

Filed:

Jan. 20, 2023
Applicant:

Semes Co., Ltd., Chungcheongnam-do, KR;

Inventors:

Seung Hoon Oh, Chungcheongnam-do, KR;

Ji Hyeong Lee, Chungcheongnam-do, KR;

Jin Se Park, Chungcheongnam-do, KR;

Yong Joon Im, Gyeonggi-do, KR;

Young Hun Lee, Chungcheongnam-do, KR;

Yong Sun Ko, Gyeonggi-do, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F26B 5/00 (2006.01); F26B 21/10 (2006.01); F26B 25/00 (2006.01); F26B 25/16 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
F26B 5/005 (2013.01); F26B 21/10 (2013.01); F26B 25/003 (2013.01); F26B 25/16 (2013.01); G03F 7/168 (2013.01);
Abstract

A substrate treating apparatus of the present disclosure comprises: a chamber member having an accommodation space configured to accommodate a vessel part where a substrate treatment region constituting a supercritical treatment space are formed, and an opening configured to move the substrate inside or outside; a shutter configured to open or close the chamber member; and a first exhaust part configured to discharge an internal air from the accommodation space to the outside, wherein the temperature of the substrate treatment region is increased.


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