The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2026
Filed:
Oct. 30, 2020
Sumco Corporation, Tokyo, JP;
Kenichi Nishioka, Tokyo, JP;
Keiichi Takanashi, Tokyo, JP;
SUMCO Corporation, Tokyo, JP;
Abstract
A system and method for producing a single crystal can prevent calculation and setting mistakes and provide an adequate correction amount in the next batch. A single crystal manufacturing system includes a pulling-up apparatus that calculates a diameter measurement value of a single crystal during a pulling-up process, calculates a first diameter of the single crystal by correcting the diameter measurement value using a diameter correction coefficient, and controls crystal pulling-up conditions based on the first diameter. A diameter measuring apparatus measures a diameter of the single crystal pulled up by the pulling-up apparatus to calculate a second diameter of the single crystal. A database server acquires the first diameter and the second diameter. The database server calculates a correction amount of the diameter correction coefficient from the first and second diameters obtained at diameter measurement positions which coincide with each other under room temperature.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile