The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2026
Filed:
Feb. 02, 2023
Samsung Electronics Co., Ltd., Suwon-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
An apparatus for processing a substrate including a reaction chamber, a stage, a showerhead, a first outer ring and a second outer ring may be provided. The stage may be arranged in the reaction chamber to support the substrate. The showerhead may be arranged in the reaction chamber to provide the substrate with a reaction gas. The first outer ring may be configured to surround an edge portion of an upper surface of the stage. The first outer ring may include at least one alignment groove. The second outer ring may be configured to surround the first outer ring. The second outer ring may include at least one alignment pin configured to be inserted into the alignment groove. The first outer ring and the second outer ring may define a main purge passage having a uniform width therebetween to improve exhaust efficiency of the reaction gas.