The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2026

Filed:

May. 14, 2020
Applicants:

Applied Materials, Inc., Santa Clara, CA (US);

Wayne State University, Detroit, MI (US);

Inventors:

Thomas Knisley, Livonia, MI (US);

Keenan N. Woods, San Ramon, CA (US);

Mark Saly, Santa Clara, CA (US);

Stefan Cwik, Detroit, MI (US);

Charles H. Winter, Bloomfield Hills, MI (US);

Assignees:

Applied Materials, Inc., Santa Clara, CA (US);

Wayne State University, Detroit, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/04 (2006.01); C23C 16/08 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45527 (2013.01); C23C 16/04 (2013.01); C23C 16/08 (2013.01);
Abstract

Methods for depositing rhenium-containing thin films on a substrate are described. The substrate is exposed to a rhenium precursor and a reducing agent to form the rhenium-containing film (e.g., metallic rhenium, rhenium nitride). The exposures can be sequential or simultaneous.


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