The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2026
Filed:
Feb. 17, 2023
Applicant:
Viavi Solutions Inc., Chandler, AZ (US);
Inventor:
Georg J. Ockenfuss, Santa Rosa, CA (US);
Assignee:
VIAVI Solutions Inc., Chandler, AZ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/00 (2006.01); C23C 14/10 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/0036 (2013.01); C23C 14/0063 (2013.01); C23C 14/10 (2013.01); C23C 14/3407 (2013.01); H01J 37/34 (2013.01); H01J 37/3417 (2013.01); H01J 37/3464 (2013.01);
Abstract
Reactive sputter deposition method and system are disclosed, in which a catalyst gas, such as water vapor, is used to increase the overall deposition rate substantially without compromising formation of a dielectric compound layer and its optical transmission. Addition to the sputtering or reactive gas of the catalyst gas can result in an increase of a deposition rate of the dielectric oxide film substantially without increasing an optical absorption of the film.
Ockenfuss, Georg. (2026). Reactive sputter deposition of dielectric films (U.S. Patent No. 12545987). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12545987
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile