The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2026

Filed:

Jun. 03, 2021
Applicant:

Materion Corporation, Mayfield Heights, OH (US);

Inventors:

David Peter Van Heerden, Mayfield Heights, OH (US);

Katharine S. Gardinier, Mayfield Heights, OH (US);

Robert S. Bailey, Mayfield Heights, OH (US);

Assignee:

MATERION CORPORATION, Mayfield Heights, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C22C 1/04 (2023.01); C22C 1/047 (2023.01); C22C 21/00 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
C22C 1/0416 (2013.01); C22C 1/047 (2023.01); C22C 21/00 (2013.01); C23C 14/3414 (2013.01);
Abstract

An Al—Sc alloy sputtering target. The target comprising from 1.0 at % to 65 at % scandium and from 35 at % to 99 at % aluminum and having a microstructure including a first aluminum matrix phase and a second phase dispersed uniformly therethrough. The second phase comprises one or more compounds corresponding to the formula ScAl, where x is from 1 to 2 and y is from 0 to 3.


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