The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2026

Filed:

Jun. 13, 2022
Applicant:

Battelle Memorial Institute, Richland, WA (US);

Inventors:

Amanda M. Lines, West Richland, WA (US);

Samuel S. Morrison, Richland, WA (US);

Lance R. Hubbard, Richland, WA (US);

Samuel A. Bryan, Richland, WA (US);

Assignee:

Battelle Memorial Institute, Richland, WA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01C 1/04 (2006.01); B01J 20/06 (2006.01); B01J 20/08 (2006.01); B01J 20/10 (2006.01);
U.S. Cl.
CPC ...
C01C 1/0411 (2013.01); B01J 20/06 (2013.01); B01J 20/08 (2013.01); B01J 20/10 (2013.01);
Abstract

Ammonia production systems are provided that can include: a reactor configured to receive Nand H; catalyst within the reactor, the catalyst comprising material having a band gap >3 eV; and a radiation conduit extending into the reactor and configured to expose the N, H, and catalyst to the radiation and form NH. Methods for producing ammonia are also provided. The methods can include: providing a catalyst comprising material having a band gap >3 eV; exposing the catalyst to both Nand H; and while the catalyst is exposed to both Nand H, exposing the catalyst to radiation to form NH. The methods can also include providing a catalyst comprising material having a high-band gap; exposing the catalyst to both Nand H; and while the catalyst is exposed to both Nand H, exposing the catalyst to gamma rays to form NH.


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