The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 03, 2026

Filed:

Dec. 31, 2021
Applicant:

Innoscience (Suzhou) Technology Co., Ltd., Suzhou, CN;

Inventors:

Ziming Du, Suzhou, CN;

Changan Li, Suzhou, CN;

Weixing Du, Suzhou, CN;

Jheng-Sheng You, Suzhou, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 30/47 (2025.01); H10D 30/01 (2025.01); H10D 62/85 (2025.01); H10D 62/854 (2025.01); H10D 64/00 (2025.01); H10D 64/23 (2025.01);
U.S. Cl.
CPC ...
H10D 30/4755 (2025.01); H10D 30/015 (2025.01); H10D 62/8503 (2025.01); H10D 62/854 (2025.01); H10D 64/111 (2025.01); H10D 64/258 (2025.01);
Abstract

A semiconductor device includes a first and a second nitride-based semiconductor layers, a gate electrode, and a doped nitride-based semiconductor layer. The doped nitride-based semiconductor layer is disposed between the second nitride-based semiconductor layer and the gate electrode. The doped nitride-based semiconductor layer has a pair of opposite ledge portions free from coverage of the gate electrode and a central portion therebetween. The second nitride-based semiconductor layer has a first portion beneath the central portion and a second portion beneath the ledge portion, and the second nitride-based semiconductor layer has a doping concentration of a dopant that selected from a highly electronegative group, in which the doping concentration from the first portion to the second portion increases.


Find Patent Forward Citations

Du, Ziming. (2026). Semiconductor device and method for manufacturing the same (U.S. Patent No. 12543340). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12543340

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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