The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2026
Filed:
Oct. 21, 2022
Applicant:
Seiko Epson Corporation, Tokyo, JP;
Inventors:
Shigeru Shiraishi, Ina, JP;
Hiyori Sakata, Minowa, JP;
Keiichi Yamaguchi, Ina, JP;
Ryuta Nishizawa, Nagano, JP;
Assignee:
SEIKO EPSON CORPORATION, , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03H 9/00 (2006.01); G01C 19/5628 (2012.01); H03H 9/215 (2006.01); H10N 30/082 (2023.01); H10N 30/85 (2023.01);
U.S. Cl.
CPC ...
H03H 9/215 (2013.01); G01C 19/5628 (2013.01); H10N 30/082 (2023.02); H10N 30/85 (2023.02);
Abstract
A method for manufacturing a vibration element includes, a base film forming step of forming a first base film at a first substrate surface of a quartz crystal substrate in first and second vibrating arm forming regions, a protective film forming step of forming a first protective film in a bank portion forming region of the first base film, and a dry-etching step of dry-etching the quartz crystal substrate through the first base film and the first protective film.