The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 03, 2026

Filed:

Nov. 30, 2023
Applicant:

Ciena Corporation, Hanover, MD (US);

Inventors:

Charles Baudot, Quebec, CA;

Alexandre D. Simard, Quebec, CA;

Elnaz Afsharipour, Quebec, CA;

Jonathan Cauchon, Lévis, CA;

Assignee:

Ciena Corporation, Hanover, MD (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/13 (2006.01); G02B 6/13 (2006.01); G02B 6/42 (2006.01); G02F 1/035 (2006.01);
U.S. Cl.
CPC ...
G02B 6/13 (2013.01); G02B 6/4224 (2013.01); G02B 6/4225 (2013.01); G02B 6/4227 (2013.01); G02F 1/0356 (2013.01);
Abstract

An article of manufacture comprises a bottom volume comprising a first region composed of a first material characterized by a first index of refraction (IOR) and having a first thickness, and thinned regions in which a portion of the first material is absent or has a thickness less than the first thickness; a middle volume on top of the bottom volume and comprising a second material characterized by a second IOR smaller than the first IOR; and a top volume on top of the middle volume and comprising alignment structures, and a photonic structure; where the top and middle volumes are in contact at an interface plane, and spatial coordinates specify two-dimensional positions, within at least one thinned region in a second plane parallel to the interface plane and with respect to the alignment structures, of portions of the photonic structure in a first plane parallel to the interface plane.


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