The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 03, 2026

Filed:

Feb. 03, 2020
Applicant:

Mayo Foundation for Medical Education and Research, Rochester, MN (US);

Inventors:

Mostafa Fatemi, Rochester, MN (US);

Bae H. Kim, London, GB;

Azra Alizad, Rochester, MN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01S 7/52 (2006.01); A61B 8/00 (2006.01); A61B 8/14 (2006.01); G01S 15/89 (2006.01);
U.S. Cl.
CPC ...
G01S 7/52047 (2013.01); A61B 8/14 (2013.01); A61B 8/5269 (2013.01); A61B 8/54 (2013.01); G01S 15/8915 (2013.01); G01S 15/8997 (2013.01);
Abstract

Systems and methods are provided for suppressing the side-lobe artifacts in ultrasound imaging with plane wave compounding. The use of discrete angles in transmitting plane waves may be used to suppress side-lobes and the resulting side-lobe artifacts without increasing the number of firings required. A method is provided that utilizes nulls in Rx beam pattern to suppress side-lobes based on the beam pattern formula. An apodization technique that uses window functions according to Tx angles and/or Rx aperture may also be used. A method using aperiodic sampling angles may also be used to suppress artifacts. Application to arbitrary interval sampling angles may be found. Suppressing artifacts according to the present disclosure may provide for wider field of view imaging without resorting to increasing the number of firings required (NFR).


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