The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2026
Filed:
May. 04, 2023
Epir, Inc., Bolingbrook, IL (US);
Issac L. Chang, Naperville, IL (US);
Sushant Sonde, Darien, IL (US);
Silviu Velicu, Willowbrook, IL (US);
Yong Chang, Naperville, IL (US);
EPIR, INC., Bolingbrook, IL (US);
Abstract
A method of performing scans on a semiconductor wafer is provided wherein the scanning motion is actuated through a system including a linear one-dimensional motion of the scan head; and rotational motion of a scanned wafer and an associated wafer holder. The wafer to be scanned is placed in a vacuum cryogenic enclosure, into the walls of which has been set an infrared window such that transmitted and reflected radiation from probing beams is perceptible by detectors outside the cryogenic enclosure. The scanning of the wafer is conducted through infrared transmittance and reflectance measurements of a probe beam focused on a point on the scanned wafer which is pumped by a pulsed laser.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile