The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2026
Filed:
Sep. 11, 2020
Sony Group Corporation, Tokyo, JP;
Shinichi Kai, Tokyo, JP;
Junji Kajihara, Tokyo, JP;
Koji Kita, Kanagawa, JP;
Naohisa Sakamoto, Kanagawa, JP;
Kazuya Takahashi, Kanagawa, JP;
Sony Group Corporation, Tokyo, JP;
Abstract
To provide an adjusting method of a positional relationship between a flow path position and a light irradiation position. The present technology provides a position adjusting method provided with an imaging step of imaging, while moving a flow path through which a microparticle is able to flow in an optical axis direction, the flow path in a plurality of positions in the optical axis direction, a movement step of moving the flow path in the optical axis direction on the basis of a focus index for each of a plurality of images acquired at the imaging step, and an adjustment step of specifying a feature position of the flow path from an image of the flow path in a position after movement at the movement step, and adjusting a positional relationship between the feature position and a reference position in a direction perpendicular to the optical axis direction.