The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2026
Filed:
Jul. 24, 2023
Applicant:
Ascentool, Inc., Palo Alto, CA (US);
Inventor:
George Xinsheng Guo, Palo Alto, CA (US);
Assignee:
Ascentool, Inc., Palo Alto, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/458 (2006.01); C23C 16/452 (2006.01); C23C 16/455 (2006.01); C23C 16/46 (2006.01); C23C 16/54 (2006.01);
U.S. Cl.
CPC ...
C23C 16/54 (2013.01); C23C 16/452 (2013.01); C23C 16/45559 (2013.01); C23C 16/458 (2013.01); C23C 16/4587 (2013.01); C23C 16/46 (2013.01);
Abstract
A plasma deposition apparatus includes a vacuum chamber, and a workpiece assembly that includes a frame that can hold a plurality of workpieces, and gas channels formed in between the workpieces and the frames. The gas channels can transport gas from a gas source to the plurality of workpieces to produce material deposition on the workpieces. The workpiece assembly can form a cylinder in the vacuum chamber.