The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2026
Filed:
Feb. 05, 2021
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Chikao Ikenaga, Tokyo, JP;
Chiaki Hatsuta, Tokyo, JP;
Hiroki Oka, Tokyo, JP;
Sachiyo Matsuura, Tokyo, JP;
Hideyuki Okamoto, Tokyo, JP;
Masato Ushikusa, Tokyo, JP;
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
A metal plate used for manufacturing a deposition mask has a thickness of equal to or less than 30 μm. An average cross-sectional area of the crystals grains on a cross section of the metal plate is from 0.5 μmto 50 μm. The average cross-sectional area of crystal grains is calculated by analyzing measurement results obtained by an EBSD method, the measuring results being analyzed by an area method under conditions where a portion with a difference in crystal orientation of 5 degrees or more is recognized as a crystal grain boundary.