The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2026
Filed:
Oct. 18, 2021
Stmicroelectronics France, Montrouge, FR;
Matthieu Nongaillard, Grenoble, FR;
Thomas Oheix, Grenoble, FR;
STMicroelectronics France, Montrouge, FR;
Abstract
The invention concerns a method of manufacturing an assembly of electronic components () on the front surface of a semiconductor wafer () comprising a plurality of field areas (), each area () comprising at least one field () and each field () comprising at least one electronic component (). The method comprises a plurality of photolithography steps to form a stack of layers forming each electronic component (), each photolithography step comprises the application of a mask successively on each field () in photolithography equipment. One of the masks further comprises an identification pattern, said mask being called identification mask. At the photolithography step associated with the identification mask, as least one photolithographic parameter of the photolithography equipment is different for each field area (), to expose the identification pattern differently in each field area ().