The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2026
Filed:
Apr. 20, 2023
Adobe Inc., San Jose, CA (US);
Pranav Aggarwal, San Jose, CA (US);
Hareesh Ravi, San Jose, CA (US);
Midhun Harikumar, Santa Clara, CA (US);
Ajinkya Gorakhnath Kale, San Jose, CA (US);
Fengbin Chen, San Jose, CA (US);
Venkata Naveen Kumar Yadav Marri, Newark, CA (US);
Adobe Inc., San Jose, CA (US);
Abstract
The present disclosure relates to systems, methods, and non-transitory computer readable media for utilizing a diffusion neural network for mask aware image and typography editing. For example, in one or more embodiments the disclosed systems utilize a text-image encoder to generate a base image embedding from a base digital image. Moreover, the disclosed systems generate a mask-segmented image by combining a shape mask with the base digital image. In one or more implementations, the disclosed systems utilize noising steps of a diffusion noising model to generate a mask-segmented image noise map from the mask-segmented image. Furthermore, the disclosed systems utilize a diffusion neural network to create a stylized image corresponding to the shape mask from the base image embedding and the mask-segmented image noise map.