The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2026
Filed:
Apr. 12, 2024
Tencent America Llc, Palo Alto, CA (US);
Thuong Nguyen Canh, Palo Alto, CA (US);
Xiaozhong Xu, Palo Alto, CA (US);
Chao Huang, Palo Alto, CA (US);
Shan Liu, Palo Alto, CA (US);
TENCENT AMERICA LLC, Palo Alto, CA (US);
Abstract
A method includes determining a symmetry plane that the divides a mesh into a first side and a second side opposite the first side; performing, on the first side of the mesh, a decimation process to generate a decimated first side of the mesh; performing UV reparameterization on the decimated first side of the mesh to generate a first side UV reparameterized mesh; performing texture transfer on the first side UV reparameterized mesh to generate a first side texture image; determining whether the first side texture image exhibits a degree of texture symmetry with the second side of the mesh that satisfies a condition; and based on a determination that the condition is not satisfied, performing a symmetry texture transfer process between a first texture coordinate on the first side and a second texture coordinate on the second side.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile