The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2026
Filed:
May. 13, 2021
Fujifilm Corporation, Tokyo, JP;
Shuhei Horita, Tokyo, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A structure damage cause estimation system, a structure damage cause estimation method, and a structure damage cause estimation server that enable a damage cause to be estimated with a high probability are provided. A structure damage cause estimation system () includes a database () that has data of a captured image and a damage cause of a structure, an image acquisition unit () that acquires a captured image of a target structure to be inspected, a damage detection unit () that detects damage from the captured image, a similar damage extraction unit () that extracts similar damage similar to the damage by using the database (), and a damage cause presentation unit () that presents damage causes of the similar damage. Also provided are a damage cause estimation method that uses the structure damage cause estimation system (), and a damage cause estimation server.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile