The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 27, 2026

Filed:

Jan. 25, 2024
Applicant:

Sap SE, Walldorf, DE;

Inventors:

Xingce Bao, Singapore, SG;

Bee Huang Tan, Singapore, SG;

Ki In Tan, Singapore, SG;

Rajesh Vellore Arumugam, Singapore, SG;

Yi Quan Zhou, Singapore, SG;

Assignee:

SAP SE, Walldorf, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 11/34 (2006.01); G06F 40/20 (2020.01);
U.S. Cl.
CPC ...
G06F 11/3476 (2013.01); G06F 40/20 (2020.01);
Abstract

Methods, systems, and computer-readable storage media for a software debugging system that leverages a LLM in combination with an entity matching model to propose solutions for mitigating errors. In some examples, the LLM is used to generate embeddings that are used to identify two or more matched historical errors. The matched historical errors are potential matches to a current error that needs to be resolved. The entity matching model is used to determine a matched historical error from the two or more matched historical errors. The LLM is also used to generate a proposed solution to the current error based on a historical solution to the matched historical error. The proposed solution can be executed to resolve the current error.


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