The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2026
Filed:
Nov. 18, 2020
Applicant:
Chempole Co., Ltd., Hwaseong-si, KR;
Inventor:
Sangjun Choi, Suwon-si, KR;
Assignee:
CHEMPOLE CO., LTD., Hwaseong-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/09 (2006.01); C08G 61/12 (2006.01);
U.S. Cl.
CPC ...
G03F 7/091 (2013.01); C08G 61/124 (2013.01); C08G 61/125 (2013.01); C08G 61/126 (2013.01); C08G 2261/124 (2013.01); C08G 2261/18 (2013.01); C08G 2261/228 (2013.01); C08G 2261/314 (2013.01); C08G 2261/3142 (2013.01); C08G 2261/3241 (2013.01); C08G 2261/3242 (2013.01); C08G 2261/3243 (2013.01);
Abstract
An anti-reflective hard mask comprises: (a) a terpolymer in the form of a hetero aromatic represented by chemical formula 1, or a terpolymer blend comprising same; and (b) an organic solvent.
Choi, Sangjun. (2026). Anti-reflective hard mask composition (U.S. Patent No. 12535736). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12535736
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile