The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2026
Filed:
Sep. 20, 2022
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Taro Miyoshi, Shizuoka, JP;
Eiji Fukuzaki, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); C07C 25/18 (2006.01); C07C 43/225 (2006.01); C07C 309/04 (2006.01); C07C 381/12 (2006.01); C07D 307/00 (2006.01); C07D 309/30 (2006.01); C07D 327/06 (2006.01); C07D 333/46 (2006.01); C07D 333/76 (2006.01); C07D 335/02 (2006.01); C08F 212/14 (2006.01); C08F 220/28 (2006.01); C08F 220/30 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 7/039 (2013.01); C07C 25/18 (2013.01); C07C 43/225 (2013.01); C07C 309/04 (2013.01); C07C 381/12 (2013.01); C07D 307/00 (2013.01); C07D 309/30 (2013.01); C07D 327/06 (2013.01); C07D 333/46 (2013.01); C07D 333/76 (2013.01); C07D 335/02 (2013.01); C08F 212/24 (2020.02); C08F 220/283 (2020.02); C08F 220/301 (2020.02); G03F 7/0045 (2013.01); G03F 7/038 (2013.01);
Abstract
The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a polarity that increases by an action of an acid, and (B) a compound that generates an acid upon irradiation with actinic rays or radiation, represented by a specific general formula, is which the resin (A) includes a repeating unit represented by a specific general formula; and an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a method for manufacturing an electronic device.