The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2026
Filed:
Aug. 26, 2022
Asm Ip Holding B.v., Almere, NL;
Thomas Fitzgerald, Gilbert, AZ (US);
Ruchik Bhatt, Chandler, AZ (US);
ASM IP Holding B.V., Almere, NL;
Abstract
A baffle for use in a reaction chamber may comprise a baffle first end, a baffle second end, and a baffle space enclosed by a baffle wall system and the reaction chamber floor, wherein the baffle first end may comprise a baffle aperture disposed therethrough configured to allow a fluid to flow from the reaction chamber volume into the baffle space through the baffle aperture and exit the baffle space through a vacuum aperture in the reaction chamber floor toward a vacuum source.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile