The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 27, 2026

Filed:

May. 29, 2023
Applicant:

Advanced Materials Technology & Engineering.co.ltd., Jiangsu, CN;

Inventors:

Jun Wan, Jiangsu, CN;

Haitao Liao, Jiangsu, CN;

Bin Wang, Jiangsu, CN;

Hui Wang, Jiangsu, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45551 (2013.01); C23C 16/52 (2013.01);
Abstract

Provided are an ALD processing apparatus and a processing method. A reactor of the processing apparatus includes a vacuum chamber and a reaction chamber, the reaction chamber is built in the vacuum chamber and is open at a top, a bottom of the reaction chamber is formed with a gas inlet channel and a gas outlet channel arranged opposite to each other with respect to centerline of the bottom of the reaction chamber in a first direction, a lifting device is provided on the reactor, an output end of the lifting device stretches and contracts vertically and is provided with a sealing cover, which operably seals the top of the reaction chamber, a transporting device is configured to transport a substrate into the vacuum chamber, a grabbing device is provided on the sealing cover, and the grabbing device is configured to grab the substrate transported into the vacuum chamber.


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