The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2026
Filed:
Jul. 20, 2018
Applicants:
Riken, Wako, JP;
Racthera Co., Ltd., Tokyo, JP;
Inventors:
Hideya Sakaguchi, Wako, JP;
Yoshiki Sasai, Wako, JP;
Mototsugu Eiraku, Wako, JP;
Daiki Nukaya, Tokyo, JP;
Atsushi Kuwahara, Hyogo, JP;
Assignees:
RIKEN, Wako, JP;
RACTHERA CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C12N 5/0793 (2010.01);
U.S. Cl.
CPC ...
C12N 5/062 (2013.01); C12N 2500/00 (2013.01); C12N 2500/32 (2013.01); C12N 2500/38 (2013.01); C12N 2501/39 (2013.01); C12N 2501/392 (2013.01); C12N 2501/71 (2013.01); C12N 2501/998 (2013.01); C12N 2501/999 (2013.01); C12N 2506/02 (2013.01);
Abstract
The present invention provides a method for maintaining a continuous epithelial structure of a retinal tissue including culturing the retinal tissue in a medium comprising a methyl group donor or a substrate of the methyl group donor at a concentration at which cell differentiation of a neural retinal progenitor cell is suppressed, and a neurite extension inhibitor at a concentration at which neurite extension is suppressed.