The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 27, 2026

Filed:

Oct. 17, 2022
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Masayoshi Fujimoto, Tochigi, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 35/08 (2006.01); B29C 59/00 (2006.01); B29C 59/02 (2006.01); B29C 59/16 (2006.01); B29L 7/00 (2006.01); B29L 9/00 (2006.01);
U.S. Cl.
CPC ...
B29C 59/026 (2013.01); B29C 35/0805 (2013.01); B29C 59/002 (2013.01); B29C 59/16 (2013.01); B29L 2007/001 (2013.01); B29L 2009/005 (2013.01);
Abstract

The imprint apparatus according to the present invention causes a supplying unit to supply an imprint material onto at least a first region in a predetermined shot region on a substrate, causes an energy supplying unit to supply energy to the imprint material on the first region so as to increase a degree of polymerization of the imprint material on the first region, causes a moving unit to move at least one of a mold and the substrate such that a pattern region formed on the mold and the imprint material on the substrate are brought into contact with each other, and causes the energy supplying unit to supply the energy to the imprint material on the predetermined shot region such that the imprint material on the predetermined shot region is solidified after the pattern region and the imprint material on the substrate are brought into contact with each other.


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