The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 27, 2026

Filed:

Sep. 16, 2022
Applicant:

Semes Co., Ltd., Cheonan-si, KR;

Inventors:

Gi Hun Choi, Changwon-si, KR;

Young Joon Han, Cheonan-si, KR;

Assignee:

Semes Co., Ltd., Chungcheongnam-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/02 (2006.01); B08B 13/00 (2006.01); H01L 21/67 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
B08B 3/022 (2013.01); B08B 3/02 (2013.01); B08B 13/00 (2013.01); H01L 21/67051 (2013.01); H01L 21/67196 (2013.01); H01L 21/67742 (2013.01); H01L 21/67766 (2013.01); B08B 2203/007 (2013.01);
Abstract

The substrate treating apparatus includes a liquid supply unit for supplying a treating liquid to a substrate supported by a support unit, the liquid supply unit includes a nozzle member for discharging the treating liquid; and a driving member for moving the nozzle member to a standby position and a process position, the nozzle member includes a body having a buffer space and a discharge port configured to discharge the treating liquid; and a rotation member for changing the body between a first state and a second state by a rotation, the first state is a state at which a treating liquid filled in the buffer space is maintained so the treating liquid does not flow to the discharge port, and the second state is a state at which the treating liquid filled in the buffer space is discharged to an outside of the body through the discharge port.


Find Patent Forward Citations

Choi, Gi. (2026). Unit for supplying liquid, apparatus and method for treating substrate with the unit (U.S. Patent No. 12533714). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12533714

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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