The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2026
Filed:
Feb. 20, 2023
Applicant:
Kioxia Corporation, Minato-ku, JP;
Inventors:
Fuyuma Ito, Yokkaichi, JP;
Tatsuhiko Koide, Kuwana, JP;
Hiroki Nakajima, Mie, JP;
Naomi Yanai, Kuwana, JP;
Tomohiko Sugita, Yokkaichi, JP;
Hakuba Kitagawa, Yokkaichi, JP;
Takaumi Morita, Kuwana, JP;
Assignee:
Kioxia Corporation, Minato-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
H10D 62/10 (2025.01); H01L 21/02 (2006.01); H01L 21/768 (2006.01); H10D 88/00 (2025.01);
U.S. Cl.
CPC ...
H10D 62/10 (2025.01); H01L 21/02019 (2013.01); H01L 21/76802 (2013.01); H10D 88/00 (2025.01);
Abstract
A semiconductor substrate includes a surface having a groove. The groove includes an inner bottom surface and an inner wall surface. The inner wall surface has a depression. The depression has a depth from a direction along a surface of the inner wall surface to a width direction of the groove. The substrate being exposed to the inner wall surface.