The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 20, 2026

Filed:

Dec. 15, 2021
Applicants:

Seoul National University R&db Foundation, Seoul, KR;

Center for Advanced Meta-materials, Daejeon, KR;

Inventors:

Namkyoo Park, Seoul, KR;

Sunkyu Yu, Seoul, KR;

Xianji Piao, Seoul, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G16C 60/00 (2019.01); G06N 3/04 (2023.01); G06N 3/08 (2023.01); G06V 10/145 (2022.01);
U.S. Cl.
CPC ...
G16C 60/00 (2019.02); G06N 3/04 (2013.01); G06N 3/08 (2013.01); G06V 10/145 (2022.01);
Abstract

Provided are a device and method for designing a material using deep learning. The method includes training a decoder which derives wave properties from given information on a material in advance, training an autoencoder including the decoder and an encoder which will be trained to derive information on a material from given wave properties, and inputting targeted wave properties to the trained encoder to acquire information on a material satisfying the input wave properties.


Find Patent Forward Citations

Park, Namkyoo. (2026). Device and method for designing material using deep learning (U.S. Patent No. 12531137). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12531137

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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