The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 20, 2026

Filed:

Aug. 07, 2023
Applicant:

Samsung Sds Co., Ltd., Seoul, KR;

Inventors:

Do Young Park, Seoul, KR;

Sun Jin Kim, Seoul, KR;

Min Kyu Kim, Seoul, KR;

Reddy Yarram Naresh, Seoul, KR;

Yu Min Lim, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/11 (2017.01); G06T 7/194 (2017.01); G06V 10/40 (2022.01); G06V 10/74 (2022.01); G06V 10/764 (2022.01); G06V 10/82 (2022.01);
U.S. Cl.
CPC ...
G06T 7/11 (2017.01); G06T 7/194 (2017.01); G06V 10/40 (2022.01); G06V 10/761 (2022.01); G06V 10/764 (2022.01); G06V 10/82 (2022.01); G06T 2207/20081 (2013.01); G06T 2207/20084 (2013.01);
Abstract

A semantic segmentation method performed by at least one computing device is provided. The method may include extracting a plurality of support features, which include a first-level feature and a second-level feature, from a support image; generating a plurality of prototypes for a class associated with the support image, based on the plurality of support features; and predicting a segmentation mask for a query image using the plurality of prototypes, wherein the plurality of prototypes comprise a first prototype generated based on the first-level feature and a second prototype generated based on the second-level feature.


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