The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2026
Filed:
Jan. 31, 2024
Salesforce, Inc., San Francisco, CA (US);
Itai Izhak Feigenbaum, San Francisco, CA (US);
Devansh Arpit, Pacifica, CA (US);
Shelby Heinecke, San Francisco, CA (US);
Juan Carlos Niebles Duque, Mountain View, CA (US);
Weiran Yao, San Francisco, CA (US);
Huan Wang, Palo Alto, CA (US);
Caiming Xiong, Menlo Park, CA (US);
Silvio Savarese, Palo Alto, CA (US);
Salesforce, Inc., San Francisco, CA (US);
Abstract
Systems and methods for editing a large language model are provided. The large language model generates a sequence of tokens, a first probability of a pre-edit output based on the sequence of tokens, and a second probability of a target output based on the sequence of tokens. A loss function is provided based on the first probability and the second probability. A plurality of gradients of the large language model with respect to the loss function is computed. An edit location of the large language model is determined based on the plurality of gradients. The large language model is edited by editing weights at the edit location of the large language model, such that the updated large language model generates the target output for an input including the sequence of words.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile