The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2026
Filed:
Feb. 22, 2022
The Regents of the University of California, Oakland, CA (US);
Joseph Toombs, Oakland, CA (US);
Hayden Taylor, Oakland, CA (US);
The Regents of the University of California, Oakland, CA (US);
Abstract
A roll-to-roll computed axial lithography system includes an optical illumination system; an optical modulation system to receive light from the optical illumination system and to output an illumination pattern of light; and a web-handling system to receive and transport a web having a photosensitive material layer such that a portion of the web will be in an optical path of the modulation system. The web-handling system includes a development module to render three-dimensional structures from the layer exposed to the illumination pattern of light. The illumination pattern of light provides predetermined three-dimensional regions within a bulk of the layer that are exposed beyond a photo-responsive threshold for the photosensitive material providing volumetric patterning. The development module removes one of regions of the layer exposed beyond the photo-responsive threshold or regions of the layer that are not exposed beyond the photo-responsive threshold to provide a three-dimensional structure from the layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile