The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 20, 2026

Filed:

Jul. 07, 2022
Applicant:

Semes Co., Ltd., Cheonan-si, KR;

Inventors:

Sang Eun Noh, Pohang-si, KR;

Dae Sung Kim, Suwon-si, KR;

Ho Jin Jang, Cheonan-si, KR;

Assignee:

Semes Co., LTD., Cheonan-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/16 (2006.01); G03F 7/30 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G03F 7/162 (2013.01); G03F 7/3021 (2013.01); H01L 21/67017 (2013.01); H01L 21/67051 (2013.01); H01L 21/6715 (2013.01); H01L 21/6719 (2013.01); H01L 21/67173 (2013.01); H01L 21/67178 (2013.01);
Abstract

Provided is an apparatus for treating a substrate. The apparatus for treating the substrate includes: a first process chamber having a first treating space therein; a second process chamber having a second treating space therein; and an exhaust unit configured to exhaust atmospheres of the first treating space and the second treating space, in which the exhaust unit includes an integrated exhaust line in which a pressure reduction unit is installed, a first exhaust line configured to connect the first process chamber and a first point of the integrated exhaust line, a second exhaust line configured to connect the first process chamber and a second point of the integrated exhaust line, and an interference alleviation unit configured to alleviate exhaust interference between the first process chamber and the second process chamber.


Find Patent Forward Citations

Noh, Sang. (2026). Apparatus for treating substrate including interference alleviation unit (U.S. Patent No. 12529960). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12529960

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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