The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2026
Filed:
Apr. 26, 2022
SK Enpulse Co., Ltd., Pyeongtaek-si, KR;
Min Gyo Jeong, Suwon-si, KR;
Seong Yoon Kim, Suwon-si, KR;
Sung Hoon Son, Suwon-si, KR;
Inkyun Shin, Suwon-si, KR;
Suk Young Choi, Suwon-si, KR;
Suhyeon Kim, Suwon-si, KR;
Kyuhun Kim, Suwon-si, KR;
Hyung-Joo Lee, Suwon-si, KR;
SK enpulse Co., Ltd., Pyeongtaek-si, KR;
Abstract
Disclosed is a photomask comprising: a transparent substrate; and a multi-layer light shielding pattern film disposed on the transparent substrate, wherein the multi-layer light shielding pattern film comprises: a first light shielding film; and a second light shielding film disposed on the first light shielding film and comprising a transition metal and at least one selected from the group consisting of oxygen and nitrogen, and wherein a surface roughness Wr of the measuring zone satisfies Equation 1 below:0 nm<≤3 nm [Equation 1]
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