The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2026
Filed:
Mar. 31, 2022
Thruwave Inc., Seattle, WA (US);
Andreas Pedross-Engel, Seattle, WA (US);
Claire M. Watts, Seattle, WA (US);
Matthew S. Reynolds, Seattle, WA (US);
ThruWave Inc., Seattle, WA (US);
Abstract
The present application is directed to image beat pattern mitigation in two-sided reflection based 3-D millimeter wave imaging. In one example, active millimeter-wave (mmWave) imaging illuminates a scene with a source of mm Wave energy and forms images based on the reflected energy. Two-sided reflection imaging can be used to overcome the occlusion by the opaque objects that would plague a transmission imaging approach. The system can produce beat-pattern-free 3-D images of the products inside an optically-opaque corrugated cardboard shipping box and further, the two-sided reflection imaging approach with image beat pattern correction shows an increased image volume even if portions of the scene are occluded.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile