The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2026
Filed:
Jul. 02, 2020
Hitachi High-tech Corporation, Tokyo, JP;
HITACHI HIGH-TECH CORPORATION, Tokyo, JP;
Abstract
The automatic analysis device includes an evaporative concentration unit configured to perform a concentration process of evaporating an extract solution obtained by extracting a component to be analyzed in a sample to concentrate the component to be analyzed; an analysis unit configured to analyze the component to be analyzed of the sample; and a control unit configured to control operations of the analysis unit and the evaporative concentration unit. The control unit determines whether to perform an evaporative concentration process on a component to be analyzed in the sample, and controls the evaporative concentration unit to concentrate a component to be analyzed in a sample which is determined to be subjected to an evaporative concentration process. The sample to be subjected to the evaporative concentration process is stored, and the control unit selects whether to perform the evaporative concentration on each sample or not based on stored content.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile