The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 20, 2026

Filed:

Jun. 17, 2020
Applicant:

Metso Finland Oy, Espoo, FI;

Inventors:

Kaj Jansson, Tampere, FI;

Eija Saari, Espoo, FI;

Assignee:

Metso Finland Oy, Espoo, FI;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 21/01 (2006.01); B01D 21/08 (2006.01); B03D 1/02 (2006.01); C02F 1/00 (2023.01); C02F 1/24 (2023.01); C02F 1/52 (2023.01); C02F 1/66 (2023.01); C02F 101/20 (2006.01); C02F 103/10 (2006.01);
U.S. Cl.
CPC ...
C02F 1/24 (2013.01); B01D 21/01 (2013.01); B01D 21/08 (2013.01); B03D 1/02 (2013.01); C02F 1/001 (2013.01); C02F 1/5245 (2013.01); C02F 1/66 (2013.01); C02F 2001/007 (2013.01); C02F 2101/20 (2013.01); C02F 2103/10 (2013.01); C02F 2209/06 (2013.01);
Abstract

A method for removing soluble and/or colloidal Si-compounds from an aqueous stream of a minerals processing plant is provided. The method includes adding coagulant(s) and/or flocculant(s) and/or flotation chemical(s) to the aqueous stream in order to facilitate formation of flocs comprising at least some of the Si-compounds, and in order to form a treated aqueous stream, subjecting the treated aqueous stream to cleaning flotation in order to separate at least some of the Si-compounds as a cleaning flotation overflow, and removing the cleaning flotation overflow. The cleaning flotation comprises gas bubbles, at least 90% of the gas bubbles having a diameter of from 0.2 to 250 μm.


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