The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 20, 2026

Filed:

Oct. 30, 2019
Applicant:

Industry-university Cooperation Foundation Hanyang University, Seoul, KR;

Inventors:

Dong Rip Kim, Seoul, KR;

Han Min Jang, Seoul, KR;

Sung Won Jo, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/04 (2006.01); B01D 71/70 (2006.01); B05D 1/02 (2006.01); B05D 5/00 (2006.01); C08G 77/04 (2006.01); H02S 40/22 (2014.01);
U.S. Cl.
CPC ...
B05D 3/046 (2013.01); B01D 71/701 (2022.08); B05D 1/02 (2013.01); B05D 3/0446 (2013.01); B05D 5/00 (2013.01); C08G 77/045 (2013.01); B01D 2323/218 (2022.08); B01D 2323/2181 (2022.08); B01D 2325/43 (2022.08); B05D 2201/02 (2013.01); B05D 2518/10 (2013.01); H02S 40/22 (2014.12);
Abstract

The present invention relates to a method for preparing a porous polymer film having a controlled pore depth, and a porous polymer film prepared thereby. A method for preparing a porous polymer film according to the present invention allows the pore depth of a porous film to be controlled simply and at a low cost, and thus allows adjustment of the light reflectance of the prepared film. A large-area film can be prepared by means of a simple method and thus can be applied to various industry fields. Films having different reflectance can be prepared and thus can be applied as low-reflection and high-reflection films for solar cells, and also as a low-reflection or high-reflection thin polymer film in the construction field or material and equipment field.


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