The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2026
Filed:
Sep. 25, 2023
Kmw Inc., Hwaseong-si, KR;
Duk Yong Kim, Yongin-si, KR;
Sung Hwan So, Hwaseong-si, KR;
Oh Seog Choi, Hwaseong-si, KR;
Seong Man Kang, Hwaseong-si, KR;
Hyoung Seok Yang, Hwaseong-si, KR;
Yong Won Seo, Hwaseong-si, KR;
Myung Hwa Kim, Hwaseong-si, KR;
Yeong Min Lee, Osan-si, KR;
Kyo Sung Ji, Osan-si, KR;
Chi Back Ryu, Hwaseong-si, KR;
KMW INC., Hwaseong-si, KR;
Abstract
A quad-polarized antenna system according to the present invention comprises a plurality of RF chains, and an antenna array in which rows of first dual-polarized antenna units and rows of second dual-polarized antenna units are alternately arranged in a horizontal direction. The first dual-polarized antenna unit and the second dual-polarized antenna unit have different dual polarization characteristics from each other. The rows of first dual-polarized antenna units are used to form at least one first beam and at least one second beam which have +/−45° polarizations, and the rows of second dual-polarized antenna units are used to form at least one third beam and at least one fourth beam which have 0°/90° polarizations. The first beam, the second beam, the third beam, and the fourth beam are formed towards different spatial directions, and the first and third beams correspond to main lobes, and the second and fourth beams correspond to grating lobes.