The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2026
Filed:
Jan. 17, 2022
Screen Holdings Co., Ltd., Kyoto, JP;
Takayoshi Tanaka, Kyoto, JP;
SCREEN Holdings Co., Ltd., Kyoto, JP;
Abstract
A substrate processing method processes a substrate. The substrate has a major surface including a concave-portion forming surface that forms a concave portion. A to-be-removed layer is formed in the concave portion. The substrate processing method includes an etching step of supplying an etching liquid that contains etching ions to the major surface of the substrate to etch the to-be-removed layer, a concentrating step of concentrating the etching liquid on the major surface of the substrate, a hydrophilizing step of hydrophilizing the concave-portion forming surface exposed by concentrating the etching liquid, an ion diffusing step of diffusing the etching ions into a rinsing liquid by supplying the rinsing liquid to the major surface of the substrate after the hydrophilizing step, and a rinsing liquid removing step of removing the rinsing liquid from the major surface of the substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile